Pentakis(ethoxy)tantalum — Ta(OEt)5

SAFC Hitech® Pentakis(ethoxy)tantalum is available in a wide range of ultra-high purity grades and is supplied to customers worldwide through our network of local distribution facilities.

To accommodate the range of customer requirements, SAFC Hitech has invested in production and filling facilities capable of handling a wide variety of different containers, specializing in fill quantities between 25g and 25kg. Customer specific containers and fill requests can also be considered.

Tantalum ethoxide
Tantalum penta-ethoxide
Ta(OEt)5
Ta(OC2H5)5
TAET

Pentakis(ethoxy)tantalum (Ta(OEt)5) is used as a tantalum source for the deposition of Ta2O5 dielectric layers which have a potential application in both DRAM and CMOS logic devices[1]. Tantalum is also a component in a number of complex oxide structures such as lead scandium tantalate, PST, [Pb(Sc0.5Ta0.5)O3] and strontium bismuth tantalate, SBT, [SrBi2Ta2O9][2]. It has been demonstrated that Ta(OEt)5, when used in combination with appropriate precursors is a useful tantalum source for both these complex oxide systems[3,4].

The physical properties of Ta(OEt)5 are such that it may be used for the deposition of tantalum containing oxides via several deposition techniques although its low vapour pressure imposes a number of limitations for grow rates.

In particular ALD has been used for Ta2O5 growth[5] with excellent conformal coverage due to the self limiting reaction process. For multimetal oxides the favoured techniques used is direct liquid injection CVD[6]. Use of Ta(OEt)5 solutions is advantageous due to the high moisture sensitivity of this product and also aids compatibility with other precursors employed.

In all applications contamination is a key factor and research work at SAFC Hitech has been successful in developing purification routes to remove metallic and organic impurities. The product purity is certified according to the specifications for each grade available.

SAFC Hitech have installed the latest technologies in process equipment design and operational control to yield efficient and reliable production facilities for Pentakis(ethoxy)tantalum. Multiple production locations and appropriate modular systems ensure an uninterrupted supply of Ta(OEt)5 globally. SAFC Hitech is basic in Ta(OEt)5 manufacturing with capabilities to produce high purity raw materials, control contamination sources and minimize impurity levels in the final product. Furthermore, SAFC Hitech employs specially developed purification processes for Ta(OEt)5 that provide the lowest levels of metallic and hydrocarbon impurity levels on a consistent basis.

Pentakis(ethoxy)tantalum is certified in-house using the latest analytical techniques, and film growth ensures the validity of the methods and that the Ta(OEt)5 is capable of producing high quality films for state of the art device fabrication.

SAFC Hitech employs the latest analytical techniques with ultra-low detection limits for all the potential contaminants in Pentakis(ethoxy)tantalum.

Ta(OEt)5 is sampled and analysed during and post manufacture to ensure the highest final product specification and reliability. The analysis is performed using a wide variety of physical characterization techniques including ICP-OES, ICP-MS, NMR, TGA, vapour pressure, GC-AED and AA, on state-of-the-art tools specially upgraded for Ta(OEt)5 impurity detection.

Considerable effort has been expended to develop suitable methodologies to provide accurate, reproducible data for the different grades of product available. As for many of its manufactured products, SAFC Hitech regularly reviews the analytical data it collects and can provide SPQ data to its customers.