Solution TMI™ — In(CH₃)₃ & (CH₃)₂NC₁₂H₂₅

SAFC Hitech® Solution TMI is available in a wide range of ultra-high purity grades and is supplied to customers worldwide through our network of local distribution facilities.

To accommodate the range of customer requirements, SAFC Hitech has invested in production and filling facilities capable of handling a wide variety of different containers, specializing in fill quantities between 25g and 25kg.

SAFC Hitech has developed an efficient method to deliver trimethylindium (TMIn) via a novel precursor system. In this system, solid trimethylindium is suspended in an extremely low V.P. adduct solution. The evaporated TMIn is continuously replenished by dissolution during the usage. This proprietary 'solution' from SAFC Hitech[1-3] offers the following advantages:

This precursor system has also been observed to reduce the trace level of oxygen containing impurities due to the somewhat weaker In-O bond versus the In-N bond[4].

Some preliminary work on 808nm SQW laser structures grown using Solution TMI has shown better PL intensities than the lasers grown from the conventional TMIn source[5]. SIMS studies have shown oxygen levels as low as 3x1016 cm-3 in LED applications.

Solution TMI behaves more efficiently than the conventional TMIn source initially as measured by recent Epison studies. Delivery is stable even down to the last 5 grams of TMIn in the bubbler[4].

The following electrical properties are obtained with Solution TMI.
InP films: n300 = 3.2 x 1014 cm-3, (µ77K = 181,000 cm2/Vs);
InGaAs/InP lattice-matched films: n300 = 1.8 x 1014 cm-3, (µ77K = 44,000 cm2/Vs), FWHM substrate/ epilayer peak = 55 arcsec.

SAFC Hitech has manufactured Solution TMI since 1985. During this time we have continued to incorporate and install the latest technologies in process equipment design and operational control to yield efficient and reliable plants that can run continuously. Built-in redundancy, modular design and multiple production locations ensure an uninterrupted supply of Solution TMI. SAFC Hitech has a simple, effective way of manufacturing Solution TMI from the basic raw materials ensuring impurity sources are at a minimum. Furthermore, SAFC Hitech employs specially developed purification processes for Solution TMI that yield the lowest levels of oxygen-containing species in the final product. The proven technique of adduct purification is also used to ensure the lowest levels of metallic and hydrocarbon impurities on a consistent basis.

Solution TMI is certified in-house using the latest analytical techniques, and periodic film growth ensures the validity of the methods and that the Solution TMI is capable of producing state-of-the-art device structures.

SAFC Hitech employs the latest analytical techniques with ultra-low detection limits for all the potential contaminants in Solution TMI.

Solution TMI is sampled and analysed during and post manufacture to ensure the highest final product specification and reliability. The analysis is performed using a wide variety of physical characterisation techniques including ICP-OES, ICP-MS, NMR, TGA, vapour pressure, GC-AED and AA, on state-of-the-art tools specially upgraded for Solution TMI impurity detection.

Considerable effort has been expended to develop suitable methodologies to provide accurate, reproducible data for the different grades of product available. As for many of its manufactured products, SAFC Hitech regularly reviews the analytical data it collects and can provide SPQ data to its customers.