Bis(methyl-η5-cyclopentadienyl)dimethylhafnium — (MeCp)2HfMe2

SAFC Hitech® Bis(methyl-η5-cyclopentadienyl)dimethylhafnium is available in a wide range of ultra-high purity grades and is supplied to customers worldwide through our network of local distribution facilities.

To accommodate the range of customer requirements, SAFC Hitech has invested in production and filling facilities capable of handling a wide variety of different containers, specializing in fill quantities between 25g and 25kg. Customer specific containers and fill requests can also be considerered.

(MeCp)2HfMe2
HfDO2
(CH3C5H4)2Hf(CH3)2

Bis(methylcyclopentadienyl)dimethylhafnium, (MeCp)2HfMe2, is used as a hafnium source for the deposition of HfO2 based layers specifically by ALD. Hafnium oxide is a leading candidate to replace silicon dioxide as the gate oxide in metal oxide semiconductor field effect transistors (MOSFET)[1]. The thin film properties which make HfO2 an attractive prospect for a gate oxide replacement also make it a potential insulating dielectric in the capacitive elements in memory devices such as DRAM[2].

The volatility and thermal stability of the source is such that (MeCp)2HfMe2 can be transported from a bubbler in conventional systems.[3]

The precursor is compatible with a number of oxidants in ALD growth processes across a wide temperature range with self limiting growth exhibited up to 400C.[4,5] It may also be used in liquid injection systems as a dilute solution. This versatile source may be used in combination with a variety of other sources to deposit mixed oxides.

In all applications contamination is a key factor and research work at SAFC Hitech has been successful in developing purification routes to remove metallic and organic impurities. Product is certified according to the specifications for each grade available.

SAFC Hitech have installed the latest technologies in process equipment design and operational control to yield efficient and reliable production facilities for Bis(methylcyclopentadienyl)dimethylhafnium. Multiple production locations and appropriate modular systems ensure an uninterrupted supply of (MeCp)2HfMe2 globally. SAFC Hitech is basic in (MeCp)2HfMe2 manufacturing with capabilities to produce high purity raw materials, control contamination sources and minimize impurity levels in the final product. Furthermore, SAFC Hitech employs specially developed purification processes for (MeCp)2HfMe2 that provide the lowest levels of metallic and hydrocarbon impurity levels on a consistent basis.

Bis(methylcyclopentadienyl)dimethylhafnium is certified in-house using the latest analytical techniques, and film growth ensures the validity of the methods and that the (MeCp)2HfMe2 is capable of producing high quality films for state-of-the-art device fabrication.

SAFC Hitech employs the latest analytical techniques with ultra-low detection limits for all the potential contaminants in Bis(methylcyclopentadienyl)dimethylhafnium.

(MeCp)2HfMe2 is sampled and analysed during and post manufacture to ensure the highest final product specification and reliability. The analysis is performed using a wide variety of physical characterization techniques including ICP-OES, ICP-MS, NMR, TGA, vapour pressure, GC-AED and AA, on state-of-the-art tools specially upgraded for (MeCp)2HfMe2 impurity detection.

Considerable effort has been expended to develop suitable methodologies to provide accurate, reproducible data for the different grades of product available. As for many of its manufactured products, SAFC Hitech regularly reviews the analytical data it collects and can provide SPQ data to its customers.